Study of silicon surface passivation of single bilayer aluminium and hafnium oxide films deposited by atomic layer deposition technique

Files

01_title.pdf (113.44 KB)

02_prelim pages.pdf (2.06 MB)

03_content.pdf (417.77 KB)

04_abstract.pdf (310.99 KB)

05_chapter 01.pdf (879.5 KB)

Abstract

newline

URI

http://hdl.handle.net/10603/629161

Collections

Physical Sciences (CSIR-NPL)