Growth and morphological studies of hydrogenated diamond like carbon films deposited by radio frequency plasma enhanced chemical vapour deposition

dc.contributor.guideJohn, Thiruvadigal Den_US
dc.coverage.spatialPhysicsen_US
dc.creator.researcherMaheswaran, Ren_US
dc.date.accessioned2013-08-07T09:33:35Z
dc.date.available2013-08-07T09:33:35Z
dc.date.awardedn.d.en_US
dc.date.completed2012en_US
dc.date.issued2013-08-07
dc.date.registeredn.d.en_US
dc.description.abstractDiamond-like carbon (DLC) is a name attributed to a variety of amorphous carbon materials, containing hydrogen in various range of atm.% of hydrogen, some containing up to about 50 atm.% hydrogen (a-C:H) and some other contains less than 1 atm.% (a-C ). The DLC term is commonly used to designate the hydrogenated form of diamond-like carbon (a-C:H), while the ta-C (tetrahedral amorphous carbon) term is used to designate the non-hydrogenated carbon (a-C), containing high fractions of sp3 hybridized carbon. An accurate control of the surface morphology and roughness of plasma deposited thin films is of crucial importance in many technological applications. The surface growth dynamics is a characteristic of both the deposition technique and process conditions applied during the film growth. Therefore, the morphological study can reveal the information about uniform and long range coating mechanisms operating for a given system as functions of deposition parameters. In the present research, the sequential variation of surface morphology of capacitively coupled RF-PECVD grown DLC films on silicon (100) substrate have been studied under three phases namely, during: growth, variation in the major RF-PECVD parameters (plasma pressure and deposition temperature) and post deposition treatment (annealing at high temperature). CH4 and Ar were used as the precursor gases to grow DLC film. This thesis consist of six chapters, the first chapter gives the brief introduction about the classification of amorphous carbon and also discusses the basic structure, properties and some application of the DLC films. Various deposition techniques ranging from IBD to RF-PECVD have been explained in brief. An overview of the development in growth mechanism of DLC films in RF-PECVD has been discussed with historical background in this chapter. Finally, an outline of the work undertaken as research is discussed. The second chapter divides into two sections.en_US
dc.description.noteBibliography p. 123-139, Images, tables givenen_US
dc.format.accompanyingmaterialNoneen_US
dc.format.dimensions-en_US
dc.format.extentxxiv,141p.en_US
dc.identifier.urihttp://hdl.handle.net/10603/10477
dc.languageEnglishen_US
dc.publisher.institutionDepartment of Physicsen_US
dc.publisher.placeKattankulathuren_US
dc.publisher.universitySRM Universityen_US
dc.relationen_US
dc.rightsuniversityen_US
dc.source.inflibnetINFLIBNETen_US
dc.subject.keywordPhysicsen_US
dc.subject.keyworddiamonden_US
dc.subject.keywordchemical vapour depositionen_US
dc.titleGrowth and morphological studies of hydrogenated diamond like carbon films deposited by radio frequency plasma enhanced chemical vapour depositionen_US
dc.title.alternative-en_US
dc.type.degreePh.D.en_US

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