Process variation RF and soft error study on fed devices

dc.contributor.guideSrinivasan R
dc.coverage.spatialProcess variation RF and soft error study on fed devices
dc.creator.researcherSasikala P
dc.date.accessioned2025-11-19T12:01:10Z
dc.date.available2025-11-19T12:01:10Z
dc.date.awarded2025
dc.date.completed2025
dc.date.registered
dc.description.abstractMany new device concepts, and new device structures have been newlineproposed, demonstrated, and investigated in the device community through newlinetheory, experiments and simulations, to tackle the short channel effects faced newlineby the conventional MOSFET devices. Field Effect Diode (FED) is one newlineamong them, and it was first proposed in 1996, and subsequently many newlinestudies have been published. Unlike the conventional MOSFET, the FED is newlinean asymmetric device, and has five terminals, (i) source, (ii) drain, and (iii) newlinesource side gate, (iv) drain side gate, and (v) substrate/ bulk terminal. The newlinesame device can be used as P or N type device. Application of appropriate newlinevoltages to the two gates brings the device into ON/OFF state. By reversing newlinethe polarity of the applied voltages both N and P type operations can be newlineachieved. newline
dc.description.note
dc.format.accompanyingmaterialNone
dc.format.dimensions21cm.
dc.format.extentxviii,113p.
dc.identifier.researcherid
dc.identifier.urihttp://hdl.handle.net/10603/674899
dc.languageEnglish
dc.publisher.institutionFaculty of Information and Communication Engineering
dc.publisher.placeChennai
dc.publisher.universityAnna University
dc.relationp.107-112
dc.rightsuniversity
dc.source.universityUniversity
dc.subject.keywordComputer Science
dc.subject.keywordComputer Science Information Systems
dc.subject.keywordConventional MOSFET devices
dc.subject.keywordEngineering and Technology
dc.subject.keywordField Effect Diode
dc.subject.keywordNew device concepts
dc.titleProcess variation RF and soft error study on fed devices
dc.title.alternative
dc.type.degreePh.D.

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