Application of glow discharge plasma processing in material analysis etching and deposition

dc.contributor.guide	Bajpai, R P
dc.coverage.spatial	Physics
dc.creator.researcher	Kumar, Ashok
dc.date.accessioned	2016-04-12T08:32:11Z
dc.date.available	2016-04-12T08:32:11Z
dc.date.awarded	n.d.
dc.date.completed	31/12/2009
dc.date.registered	n.d.
dc.description.abstract	Abstract not available
dc.description.note	Data not available
dc.format.accompanyingmaterial	None
dc.format.dimensions	72cm.
dc.format.extent	ciii, 107p.
dc.identifier.uri	http://hdl.handle.net/10603/80519
dc.language	English
dc.publisher.institution	Department of Physics
dc.publisher.place	Chandigarh
dc.publisher.university	Panjab University
dc.relation	Reference available at chapters
dc.rights	university
dc.source.university	University
dc.subject.keyword	Debye
dc.subject.keyword	Fluorine
dc.subject.keyword	Ionization
dc.subject.keyword	Oxygen
dc.subject.keyword	plasma
dc.title	Application of glow discharge plasma processing in material analysis etching and deposition
dc.title.alternative
dc.type.degree	Ph.D.