A Study of Front-Side Etching Technology in the Fabrication of Vacuum Sealed Absolute Micro Pressure Sensor
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Abstract
A study on front side etching technology in the fabrication of membrane
newlinetype absolute micro pressure sensor
newlineFabrication of thin membranes has been an important aspect in common
newlinemicromechanical devices owing to its numerous industrial applications. The pressure
newlinesensing technology that provides a multiple-measurement and multiple-range capability
newlineis also based on a thin diaphragm or membrane fabrication process. This thesis describes
newlinethe experimental details of the fabrication of a thin membrane over a conical V-shaped
newlinecavity using front side lateral etching technology and the results obtained are discussed.
newlineIn the reported work, front side lateral etching technology has been studied. This
newlinestudy proposes a novel front side etching fabrication process for silicon based
newlinepiezoresistive pressure sensor. As far as the fabrication process is concerned, this
newlinetechnique successfully accomplished a front side etching process laterally to replace the
newlineconventional back-side bulk micromachining. This novel structure pressure sensor can
newlineachieve the distinguishing features of the chip size reduction and fabrication costs
newlinedegradation.
newlineThe study presented in this thesis is divided into six chapters as follows, each
newlinestarting with an introduction and ending with references together with the seventh chapter
newlineon summary and conclusions.
newlineII
newlineChapter 1: Introduction
newlineChapter 2: Thin Film Materials
newlineChapter 3: Anisotropic Etching
newlineChapter 4: Fundamental Theory and Design of Micro Pressure Sensor
newlineChapter 5: Fabrication of Absolute Micro Pressure Sensor using Front-Side-Lateral
newlineEtching Technology
newlineChapter 6: In-Process Observations and Discussions
newlineChapter 7: Summary and Conclusions
newlineChapter 1 on Introduction describes micromachining and micro fabrication
newlinetechnologies (e.g., submicron photolithography, thermal oxidation, thin film deposition
newlineand chemical etching etc.) to construct the three dimensional micro-electro-mechanical
newline(MEMS) devices such as the fabricated device- absolute micro pressure sensor.