Study of reactive ion beam sputtered hydrogenated amorphous silicon germanium and their alloy films

dc.contributor.guide	Malhotra, L.K. and Kashyap, Subhash C.
dc.coverage.spatial	Department of Physics
dc.creator.researcher	Krishan, Bhan Mohan
dc.date.accessioned	2025-01-23T10:34:10Z
dc.date.available	2025-01-23T10:34:10Z
dc.date.awarded	1989
dc.date.completed	1989
dc.date.registered
dc.description.abstract	Abstract Available
dc.description.note	NA
dc.format.accompanyingmaterial	DVD
dc.format.dimensions	NA
dc.format.extent	NA
dc.identifier.researcherid
dc.identifier.uri	http://hdl.handle.net/10603/617109
dc.language	English
dc.publisher.institution	Department of Physics
dc.publisher.place	Delhi
dc.publisher.university	Indian Institute of Technology Delhi
dc.relation	TH1657
dc.rights	university
dc.source.university	University
dc.subject.keyword	Physical Sciences
dc.subject.keyword	Physics
dc.subject.keyword	Physics Multidisciplinary
dc.title	Study of reactive ion beam sputtered hydrogenated amorphous silicon germanium and their alloy films
dc.title.alternative	NA
dc.type.degree	Ph.D.