Synthesis and characterization of nano structured silicon by metal assisted chemical etching and effect of plasma treatment on the studied properties

dc.contributor.guide	Dr. R. Padma Suvarna
dc.coverage.spatial	Physics
dc.creator.researcher	Karanam Madhavi
dc.date.accessioned	2018-04-25T09:23:20Z
dc.date.available	2018-04-25T09:23:20Z
dc.date.awarded	01-01-2018
dc.date.completed	03-08-2017
dc.date.registered	17-08-2011
dc.description.abstract	No newline
dc.description.note	SummaryandConclusion-159-165 , References 166-194
dc.format.accompanyingmaterial	None
dc.format.dimensions	---
dc.format.extent	xvi, 194 P
dc.identifier.uri	http://hdl.handle.net/10603/202037
dc.language	English
dc.publisher.institution	Department of Physics
dc.publisher.place	Anantapuram
dc.publisher.university	Jawaharlal Nehru Technological University, Anantapuram
dc.relation	No. of References -309
dc.rights	university
dc.source.university	University
dc.subject.keyword	ECR plasma
dc.subject.keyword	Etching Solution
dc.subject.keyword	Physics
dc.subject.keyword	Porous Silicon
dc.subject.keyword	Si NW
dc.title	Synthesis and characterization of nano structured silicon by metal assisted chemical etching and effect of plasma treatment on the studied properties
dc.title.alternative
dc.type.degree	Ph.D.