Deposition and characterization of high k dielectric thin films for mos capacitors

dc.contributor.guide	Mahajan, A M
dc.coverage.spatial	Electronics Engineering
dc.creator.researcher	Khairnar, Anil Gulabrao
dc.date.accessioned	2017-05-11T05:19:24Z
dc.date.available	2017-05-11T05:19:24Z
dc.date.awarded	n.d.
dc.date.completed	2015
dc.date.registered	n.d.
dc.description.abstract	None
dc.description.note	n.d.
dc.format.accompanyingmaterial	None
dc.format.dimensions	-
dc.format.extent	n.d.
dc.identifier.uri	http://hdl.handle.net/10603/148898
dc.language	English
dc.publisher.institution	Department of Electronics Engineering and Technology
dc.publisher.place	Jalgaon
dc.publisher.university	North Maharashtra University
dc.relation	-
dc.rights	university
dc.source.inflibnet	INFLIBNET
dc.subject.keyword	Characterization
dc.subject.keyword	Deposition
dc.subject.keyword	Dielectric
dc.subject.keyword	Film
dc.title	Deposition and characterization of high k dielectric thin films for mos capacitors
dc.title.alternative	-
dc.type.degree	Ph.D.