Physical and Chemical properties of  PVD deposited v2o5 Thin films for  Electrocatalytic and Optoelectronic  Applications

dc.contributor.guide	Ravi,G
dc.coverage.spatial
dc.creator.researcher	Shrividhya,T
dc.date.accessioned	2017-02-13T08:56:07Z
dc.date.available	2017-02-13T08:56:07Z
dc.date.awarded	02/09/2016
dc.date.completed	16/06/2016
dc.date.registered	07/12/2011
dc.description.abstract	newline
dc.description.note	References p.261-280
dc.format.accompanyingmaterial	DVD
dc.format.dimensions
dc.format.extent	xx,280p.
dc.identifier.uri	http://hdl.handle.net/10603/134163
dc.language	English
dc.publisher.institution	Department of Physics
dc.publisher.place	Karaikudi
dc.publisher.university	Alagappa University
dc.relation
dc.rights	university
dc.source.university	University
dc.subject.keyword	Applications
dc.subject.keyword	Electrocatalytic and Optoelectronic
dc.subject.keyword	Physical and Chemical properties
dc.subject.keyword	PVD deposited
dc.subject.keyword	v2o5 Thin films
dc.title	Physical and Chemical properties of PVD deposited v2o5 Thin films for Electrocatalytic and Optoelectronic Applications
dc.title.alternative
dc.type.degree	Ph.D.