Preparation and characterization of zinc alluminium oxide thin films by DC reactive magnetron sputtering

dc.contributor.guideRao, T Subba
dc.coverage.spatialPhysics
dc.creator.researcherB.Rajesh kumar
dc.date.accessioned2017-08-18T09:33:56Z
dc.date.available2017-08-18T09:33:56Z
dc.date.awardedn.d.
dc.date.completed2012
dc.date.registeredn.d.
dc.description.abstractNot available
dc.description.noteReferences available at chapter
dc.format.accompanyingmaterialnone
dc.format.dimensions-
dc.format.extent195 p.
dc.identifier.urihttp://hdl.handle.net/10603/168540
dc.languageEnglish
dc.publisher.institutionDepartment of Physics
dc.publisher.placeTirupati
dc.publisher.universitySri Venkateswara University
dc.rightsuniversity
dc.source.universityUniversity
dc.titlePreparation and characterization of zinc alluminium oxide thin films by DC reactive magnetron sputtering
dc.title.alternative-
dc.type.degreePh.D.

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