Fabrication and characterization of some oxide based semiconductor thin films using indigenously developed Aerosol Assisted Chemical Vapor Deposition AA CVD system

dc.contributor.guide	P K, Sen; Ganguli, Tapas
dc.coverage.spatial	Applied Physics
dc.creator.researcher	Kaushik, Vipin Kumar
dc.date.accessioned	2019-05-09T06:37:23Z
dc.date.available	2019-05-09T06:37:23Z
dc.date.awarded	n.d.
dc.date.completed	2016
dc.date.registered	n.d.
dc.description.abstract	Abstract not available
dc.description.note	Data not available
dc.format.accompanyingmaterial	None
dc.format.dimensions	30cm.
dc.format.extent	lx, 144p.
dc.identifier.uri	http://hdl.handle.net/10603/241470
dc.language	English
dc.publisher.institution	Department of Applied Physics, SGSITS
dc.publisher.place	Indore
dc.publisher.university	Devi Ahilya Vishwavidyalaya
dc.relation	Reference available at chapters
dc.rights	university
dc.source.university	University
dc.subject.keyword	AA-CVD
dc.subject.keyword	Fabrication
dc.subject.keyword	Semiconductor
dc.title	Fabrication and characterization of some oxide based semiconductor thin films using indigenously developed Aerosol Assisted Chemical Vapor Deposition AA CVD system
dc.title.alternative
dc.type.degree	Ph.D.