Thermally Aware Performance Analysis of Mixed Carbon Nanotube Based VLSI Interconnects
Loading...
Date
item.page.authors
Journal Title
Journal ISSN
Volume Title
Publisher
Abstract
Nowadays, excessive technology scaling in the deep sub-micron (DSM) regime allows the
newlineintegration of immense functions on a single chip. As a result of excessive scaling, copper-based
newlineon-chip interconnect performance degrades, thus necessitating the search for an alternative
newlinesuitable material for future nano interconnects. For the next generation of interconnects, the
newlinepotential material should be capable of manifesting minimized propagation delay, power
newlinedissipation, and the effects of functional as well as dynamic crosstalk in the coupled
newlineinterconnects.
newlineThe current work aims to find the best material possible for making future generation
newlineinterconnects which provide better performance by eliminating coupling effects between
newlineadjoining interconnects.
newlineThe most befitting material has turned out to be carbon-based interconnects such as CNT and
newlineGNR. In the present work, a realistic CNT bundle such as mixed CNT (m-CNT) bundle made
newlineup of both single wall carbon nanotube (SWCNT) and multi wall carbon nanotubes (MWCNT)
newlinewith different placements is considered for performance analysis under temperature as an
newlineobligatory component.
newlineA temperature-dependent crosstalk model based on ABCD parameter matrix along with
newlinedecoupling technology, with application of driver interconnect load (DIL) in coupled m-CNT
newlinebundle (MCB) interconnects is taken. A study is carried out at 14nm technology node to examine
newlinethe effects of irradiation-induced defects on MCB interconnects by considering tunneling and
newlineinter-shell capacitances in an equivalent capacitance model over a temperature range from 300K
newlineto 500K. In addition, the performance of capacitively coupled interconnects of MCB has also
newlinebeen discussed and compared with copper interconnects in terms of propagation delay, power
newlinedissipation, crosstalk induced noise voltage, and frequency spectrum. The propagation delay of
newlinethe four different structures of MCB, e.g. S1, S2, S3 and S4 (aka ST-1, ST-2, ST-3 and ST-4,