Approach to submicron pattern replication by an improved x ray source

dc.contributor.guide	Singh, Nirmal
dc.coverage.spatial	Science
dc.creator.researcher	Dhar, Rakesh
dc.date.accessioned	2016-05-04T12:26:56Z
dc.date.available	2016-05-04T12:26:56Z
dc.date.awarded	n.d.
dc.date.completed	31/05/1992
dc.date.registered	n.d.
dc.description.abstract	Abstract available
dc.description.note	Data not available
dc.format.accompanyingmaterial	None
dc.format.dimensions	69cm.
dc.format.extent	xvi, 71p.
dc.identifier.uri	http://hdl.handle.net/10603/88163
dc.language	English
dc.publisher.institution	Faculty of Science
dc.publisher.place	Chandigarh
dc.publisher.university	Panjab University
dc.relation	53-68
dc.rights	university
dc.source.university	University
dc.subject.keyword	Submicron
dc.subject.keyword	Replication
dc.subject.keyword	Improved
dc.subject.keyword	Lithography
dc.subject.keyword	Electron
dc.title	Approach to submicron pattern replication by an improved x ray source
dc.title.alternative
dc.type.degree	Ph.D.