Integration of Layered Materials with Group III Nitride Semiconductors for Dual band Photodetection

dc.contributor.guideNath, Digbijoy N
dc.creator.researcherSolanke, Swanand Vishnu
dc.date.accessioned2022-12-18T06:24:46Z
dc.date.available2022-12-18T06:24:46Z
dc.date.awarded2020
dc.date.completed2019
dc.description.abstractIn many applications, simultaneous detection in two distinct bands, UV and IR regime is required. An instrumentation in which detection in both the bands achievable using single device would be highly desirable owing to its cost effectiveness, ease in fabrication and ease in operation. Many attempts were made to integrate two materials to make device capable in dual band detection. One of such attempts was epitaxial stacking of two different members of Group-III Nitride family members, possessing different bandgap, to form single device. However, such epi-stacks suffer from lattice mismatch, difficulty in growth and fabrication, traps and dislocations generating because of lattice mismatch, thus affecting electrical and optical performance of the device. In such difficulties, layered materials (or commonly referred as 2D semiconductors) have gained big interest thanks to their exciting properties. Layered materials (LMs) can be transferred virtually on any substrate using very simple methods without worrying about lattice mismatch issues. They have excellent electrical and optical properties which make them attractive candidates for optoelectronic applications. Through this work, we attempt to integrate layered materials with GaN, a wide bandgap Group-III Nitride semiconductor and show that, by using simple integration techniques and extreme bandgap engineering by exploiting band alignments in heterojunction, it is possible to achieve dual band photo detection. We started with Integration of MoS2 with GaN. By fabricating MSM device such that metal formed contact only on MoS2 and not on GaN, we showed that it is possible to extract photocarriers generated in GaN layer underneath through MoS2 layer. The detection spectra showed two sharp edges in spectral responsivity (SR) graph, one at 365 nm (UV) and another at 685 nm (Visible). Normalised SR was found out to be 127 A/W and 33 A/W at 365 nm and 685 nm respectively. Device showed persistent photoconductivity (PCC) making it a slow device...
dc.format.accompanyingmaterialNone
dc.format.dimensions30
dc.format.extentxviii, 88
dc.identifier.urihttp://hdl.handle.net/10603/427123
dc.languageEnglish
dc.publisher.institutionCentre for Nano Science and Engineering
dc.publisher.placeBangalore
dc.publisher.universityIndian Institute of Science Bangalore
dc.rightsuniversity
dc.source.universityUniversity
dc.subject.keywordEngineering
dc.subject.keywordEngineering and Technology
dc.subject.keywordEngineering Electrical and Electronic
dc.titleIntegration of Layered Materials with Group III Nitride Semiconductors for Dual band Photodetection
dc.title.alternativeIntegration of Layered Materials with Group-III Nitride Semiconductors for Dual band Photodetection
dc.type.degreePh.D.

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