Growth of carbon nanostructures by microwave plasma enhanced chemical vapor deposition and their field emission properties

dc.contributor.guideVankar, V.D. and Vikram Kumar
dc.coverage.spatialDepartment of Physics
dc.creator.researcherSrivastava, Sanjay Kumar
dc.date.accessioned2025-03-28T06:01:26Z
dc.date.available2025-03-28T06:01:26Z
dc.date.awarded2006
dc.date.completed2006
dc.date.registered
dc.description.abstractnewline
dc.description.note
dc.format.accompanyingmaterialDVD
dc.format.dimensions
dc.format.extent
dc.identifier.researcherid
dc.identifier.urihttp://hdl.handle.net/10603/630636
dc.languageEnglish
dc.publisher.institutionDepartment of Physics
dc.publisher.placeDelhi
dc.publisher.universityIndian Institute of Technology Delhi
dc.relationTH3406
dc.rightsuniversity
dc.source.universityUniversity
dc.subject.keywordPhysical Sciences
dc.subject.keywordPhysics
dc.subject.keywordPhysics Applied
dc.titleGrowth of carbon nanostructures by microwave plasma enhanced chemical vapor deposition and their field emission properties
dc.title.alternative
dc.type.degreePh.D.

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