Synthesis Microstructure and properties of TiAL thin films prepared by DC Magnetron Co Sputtering Technique

dc.contributor.guideRaghunathan.V.S
dc.creator.researcherPadmaprabu.C.P
dc.date.accessioned2018-04-02T05:52:00Z
dc.date.available2018-04-02T05:52:00Z
dc.date.completed2000
dc.date.registered19/07/1996
dc.description.abstractSynthesis microstructure and properties of TiAL thin films prepared by DC Magnetron co Sputtering technique newline
dc.format.accompanyingmaterialDVD
dc.identifier.urihttp://hdl.handle.net/10603/198275
dc.languageEnglish
dc.publisher.institutionIndira gandhi Center for Atomic Research
dc.publisher.placeChennai
dc.publisher.universityUniversity of Madras
dc.rightsuniversity
dc.source.universityUniversity
dc.titleSynthesis Microstructure and properties of TiAL thin films prepared by DC Magnetron Co Sputtering Technique
dc.type.degreePh.D.

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