surface modification and electrical characterization of porous low k thin films for nanoelectronics applications

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dc.contributor.guideMahajan, A Men_US
dc.coverage.spatialElectronicsen_US
dc.creator.researcherMhaisagar,Yogesh Sureshen_US
dc.date.accessioned2015-02-24T07:34:55Z
dc.date.available2015-02-24T07:34:55Z
dc.date.awardedn.d.en_US
dc.date.completed2013en_US
dc.date.issued2015-02-24
dc.date.registeredn.d.en_US
dc.description.abstractNoneen_US
dc.description.noten.d.en_US
dc.format.accompanyingmaterialNoneen_US
dc.format.dimensions-en_US
dc.format.extentn.d.en_US
dc.identifier.urihttp://hdl.handle.net/10603/36177
dc.languageEnglishen_US
dc.publisher.institutionDepartment of Electronicsen_US
dc.publisher.placeJalgaonen_US
dc.publisher.universityNorth Maharashtra Universityen_US
dc.relation-en_US
dc.rightsuniversityen_US
dc.source.inflibnetINFLIBNETen_US
dc.subject.keywordelectrical characterizationen_US
dc.subject.keywordmodificationen_US
dc.subject.keywordsurfaceen_US
dc.titlesurface modification and electrical characterization of porous low k thin films for nanoelectronics applicationsen_US
dc.title.alternative-en_US
dc.type.degreePh.D.en_US

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